Thermal annealing effects on the interface state density of metal-oxide-semiconductor capacitors with electron cyclotron resonance plasma enhanced chemical vapor deposition Silicon dioxide

Authors: Maiolo L., Pecora A., Cuscuna M., Fortunato G.
Years: 2007
Source Title: Thin Solid Films
Doi: 10.1016/j.tsf.2006.11.057
Venue: CNR Nanotec @ Lecce