Surface texturing of n- and p-doped c-Si using a novel plasma chemical texturing process

Authors: Dilonardo E., Bianco G.V., Giangregorio M.M., Bruno G., Capezzuto P., Losurdo M.
Years: 2011
Source Title:
Doi: 10.1016/j.egypro.2011.10.143
Venue: NanoChem @ URT Bari