Silicon nitride and oxynitride films deposited from organosilicon plasmas: ToF-SIMS characterization with multivariate analysis

Authors: Piras F.M., Di Mundo R., Fracassi F., Magnani A.
Years: 2008
Source Title:
Doi: 10.1016/j.surfcoat.2007.07.016
Venue: NanoChem @ URT Bari