Facilities & Labs

For more than 40 years, the research groups at the NanoCheM Unit have served as a national and international leader in plasma science and technology devoted to the development of multifunctional materials by advancing the study of innovative chemical and plasma processes for the synthesis, surface functionalization and engineering of materials, nanostructures and devices.

The research activities are focused on the following 4 objectives:

  1. Functional Chemistry of Graphene and other Bidimensional materials;
  2. Tailoring of Chemical processes and Interface Phenomena in heterojunctions, hybrids and multicomponents systems for photonics, nano- and opto-electronics;
  3. Advanced materials for Energy and Environment;
  4. Plasmachemistry processes for health science

The facilities available for the research activity @ NanoCheM are organized in 8 labs.
Three labs are dedicated to material growth and processing also by plasma assisted processes: •Graphene and 2D Materials Lab, •Chemical Vapor Deposition (CVD) Lab, •Plasma Technologies Lab. One lab includes facilities for the manipulation of cellular interactions with biomaterials: •Bio Lab. Three labs are for advanced characterizations of •Chemical-Structural, •Optical and •Electrical characterizations. An ancillary lab dedicated to •wet chemistry
In addition to the equipment presents in these Labs, extensive facilities of Chemistry Dpt of Bari University (SEM, XPS, Chemical Characterization, and others) are available.

Graphene and 2D Materials Lab

This lab, also known as Apulian Graphene Lab, is specialized in the production of high quality graphene layers by CVD (Chemical Vapor Deposition)  and Epitaxy on SiC (silicon carbide), and in reliable plasma-chemical methods designed for surface functionalization of  graphene (fluorination, hydrogenation, oxidations). Also, the CVD synthesis of 2D-TMD (WS2, MoS2) is investigated. The lab is equipped with three reactors:• Little Boy (CVD graphene on large area 10cmx10cm), •GB-Reactor (epi-growth of graphene by SiC), and •Big Boy (CVD growth of TMD)

Following that, the materials are characterized  and investigated  at the nanoscale, ultimately to be used for a variety of specific application spanning  from  photonics, photovoltaics and for sensors

Chemical Vapor Deposition (CVD) Lab

The CVD lab includes:

  1. a Remote plasma MOCVD system (Spirit 92 reactor) designed for the growth and processing of III-V semiconductors (InP, GaN, InN,…)
  2. A CVD-sputtering assisted system (GB reactor) for the growth of oxides, TCOs, ceramics, and metals .
  3. A PECVD system (Silvy reactor) for the growth of Si and SiGe based alloys.

All our system have a plasma integrated source as well as in siru real time monitoring techniques of spectroscopic ellipsometry, mass spectrometry and optical emission spectroscopy for the kinetic analysis of growth and monitoring of processes.

Plasma Technologies Lab

LOW PRESSURE PLASMA

  1. PLASMA TUBE and PLASMA TROLL  with interbal or external moving electrodes
  2. FLUOMEM home made PECVD reactor. Low pressure equipment with magnetron sputtering for codeposition processes or multilayer coatings
  3. NANOS Reactive ion etching home made plasma reactor.
  4. SPACE-SHIP mounting 3 independent movable 2” magnetron sputtering sources

ATMOSPHERIC PRESSURE PLASMA

  1. Petri-Plas+ Volume-DBD designed by INP-Greifswald, Germany,
  2. DBD Reactor Electrode configuration: with pneumatic aerosol generators for nano-composite deposition
  3. Jet Coaxial cylindrical DBD electrode configuration.

Bio Lab

Heracell CO2 incubator  for growing eukaryotic cell lines

Herasafe biological hood to manipulate eukaryotic cell lines

Centrifuges to collect cells/RNA/cDNA

Mixing shakers orbital  to  grow

Autoclave

Biorad  Power supply and electrophoresis sistem to analyze DNA/proteins for studying gene expression

Applied Biosystems® Veriti® 96-Well Thermal Cycler to amplify cDNA fragments to study specific gene expression of cells grown on different surfaces (PCR)

Chemical-Structural Characterization Lab

Several scanning probe microscopes with various measurements modes such as atomic force microscopy (AFM), lateral force microscopy (LFM), electrical force microscopy (EFM), magnetic force microscopy (MFM).

Zeiss Supra 40 Field-Emission Scanning Electron Microscope

THETAPROBE  THERMO X-ray Photoectron Spectroscopy

Fluorescence (Zeiss Axiomat) and inverted (Nikon Eclipse) optical microscopes

ALPHA-STEP D-120, Tencor Instruments.  for  2D profiling.

KSV CAM200 measuring surface and interfacial tension, static and dynamic contact angles

Optical Characterization Lab

The optical characterization lab includes

-4 different spectroscopic ellipsometers covering the UV-VIS—NIR spectra range also equipped with temperature programmable cells for the analysis in liquids and controlled gas atmospheres

-A high resolution Raman spectrometer equipped with 4 lasers  and a temperature programmable sample stage

– various visible and FTIR spectrofotometers

-several optical microscopes

–photoluminescence and fluorescence spectroscopies

Optoelectronic Characterization Labs

The facility is located at Department of Physics in BARI and the equipments are usable parts on the basis of the agreement signed between CNR-NANOTEC and the Dipartimento Interateneo di Fisica- UNIBA and parts thanks to the INFN association of M. Ambrico and P.F. Ambrico. The PON SISTEMA : “Laboratorio per lo Sviluppo Integrato delle Scienze e delle TEcnologie dei Materiali Avanzati e per dispositivi innovativi” Potenziamento Strutturale PONa3_00369, Coordinator: UNIBA, allowed the update of all the equipments.

At present, the Material Optoelectronic Characterization LAB facility consist of:

  1. A Janis Vacuum Chamber and Probe Statio (PON SISTEMA). The apparatus allows real time controlled electrical measurements under different ambient conditions, light exposure and configurations.
  2. A Novocontrol Electrical Impedance Spectroscopy apparatus (PON SISTEMA) for high performance dielectric, conductivity, electrochemical, impedance and gain phase measurements in the frequency domain and high general purpose performance like highest accuracy and ultra wide impedance and frequency range.
  3. The TL/OSL reader apparatus for thermoluminesce measurements c/o -Laboratorio di Ricerca per la Diagnostica dei Beni Culturali UNIBA-(INFN).
  4. The OPO laser Spectroscopy Lab (PON SISTEMA) for LIF, CRDS, Photoluminescence, ToF.
  5. Other available apparatus and general purposes equipment

Electrical Characterization Lab

Our expertise is on the (current-voltage) I-V characterization of semiconductors and related materials as well of photovoltaic solar cells. The facilities available in this lab are: Van-der Pauw/Hall instrument to measure the resistivity and the Hall coefficient (MMR) also as a function of temperature;  instrument for the spectral responsivity of the photocurrent; high resistance electrometer (Keithley) for sensitive measurements on thin films and 2D material; metal evaporator (Balzers) for electrical contacts, (metals currently being used include Au, Ag, Al, In) with monitored and controlled thickness by quartz microbalance; high vacuum chamber with high temperature heater for electrical measurements under controlled gas environment.

Wet chemistry Lab

Applications

  1. Chemical etching
  2. Chemical cleaning of semiconductors wafers
  3. Surface functionalizations (thiols, silazanes,amines, amides, siloxanes,etc..)
  4. Deposition of nanoparticles from colloidal solutions
  5. Drop casting of organic films
  6. Self-assembled layers of biomolecules, proteins, DNA

Equipment

  1. Solvent cup drain
  2. Ultrasonic bath
  3. Temperature controlled hotplates
  4. Dual process timers
  5. Controlled N2 atmosphere operation
  6. Bruwer CEE200 High Precision Spin coater
  7. QCM-D Q-SENSE quartz crystal microbalance with dissipation monitoring.

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