Plasma ehnancement of metalorganic chemical vapor deposition and properties of Er2 O3 nanostructured thin films

Authors: Giangregorio M.M., Losurdo M., Sacchetti A., Capezzuto P., Bruno G., Malandrino G., Fragal I.L., Lo Nigro R., Armelao L., Barreca D., Tondello E.
Years: 2007
Source Title:
Doi: 10.1063/1.2768915
Venue: NanoChem @ URT Bari