From amorphous to microcrystalline silicon deposition in SiF4-H2-He plasmas: In situ control by optical emission spectroscopy

Authors: Cicala G., Capezzuto P., Bruno G.
Years: 2001
Source Title:
Doi: 10.1016/S0040-6090(00)01584-4
Venue: NanoChem @ URT Bari