Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Authors: Milella A., Creatore M., Blauw M.A., van de Sanden M.C.M.
Years: 2007
Source Title:
Doi: 10.1002/ppap.200700127
Venue: NanoChem @ URT Bari