Boron distribution in silicon after excimer laser annealing with multiple pulses

Authors: Monakhov E.V., Svensson B.G., Linnarsson M.K., La Magna A., Italia M., Privitera V., Fortunato G., Cuscuna M., Mariucci L.
Years: 2005
Source Title: Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Doi: 10.1016/j.mseb.2005.08.058
Venue: CNR Nanotec @ Lecce