Structural and some other properties of silicon deposited in an SiCl4H2 r.f. discharge

Authors: Iqbal Z., Capezzuto P., Braun M., Oswald H.R., Veprek S., Bruno G., Cramarossa F., Stussi H., Brunner J., Scharli M.
Years: 1982
Source Title:
Doi: 10.1016/0040-6090(82)90569-7
Venue: NanoChem @ URT Bari