SPECTROSCOPIC DIAGNOSTICS OF CF//4-O//2 PLASMAS DURING Si AND SiO//2 ETCHING PROCESSES.

Authors: d’Agostino Riccardo, Cramarossa Francesco, De Benedictis Santolo, Ferraro Giovanni
Years: 1981
Source Title:
Doi: 10.1063/1.329748
Venue: NanoChem @ URT Bari