Silicon dioxide deposited by ECR-PECVD for low-temperature Si devices processing

Authors: Pecora A., Maiolo L., Bonfiglietti A., Cuscuna M., Mecarini F., Mariucci L., Fortunato G., Young N.D.
Years: 2005
Source Title: Microelectronics Reliability
Doi: 10.1016/j.microrel.2004.09.012
Venue: CNR Nanotec @ Lecce