RF plasma deposition of amorphous silicon-germanium alloys: Evidence for a chemisorption-based growth process

Authors: Bruno Giovanni, Capezzuto Pio, Cicala Grazia, Manodoro Piero, Tassielli Vito
Years: 1990
Source Title:
Doi: 10.1109/27.61506
Venue: NanoChem @ URT Bari