The work on Graphene and related 2D layered materials in the Apulian Graphene Lab at CNR-NANOTEC institute is addressed minly to the development of methodologies of Production and Material Processing. We also develop simple devices for the assessment of the potential applications and for the validation of the materials properties.
Graphene production is performed by CVD on copper, CVD-graphene, (large are growth up to 300 cm2) and by SiC sublimation, Epitaxial-graphene, (graphene on SiC wafer up to 1” diameter) on Si-face (mono and bilayer graphene) and on C-face (few layers graphene).
2D layered materials synthesis. With an expertise of decades of research in the CVD technologies, we are working on the development of efficient processes for the growth of transition metal dichalcogenides (MoS2, WS2); the goal is the growth of single- and few-layer materials on graphene as well as on other epitaxial substrates (van der Walls growth) for the optoelectronic applications.
Graphene Material Processing is on methodologies for graphene transferring on different substrates (glass, silicon and plastic) and on wet and dry procedures for doping and functionalization of single and multilayer graphene. Here, our expertise is on the plasma processing of graphene for the production of graphane, fluorographene and graphene oxide, thus tailoring properties to explore new applications in optoelectronic, sensors, energy and biotechnology.
Graphene Characterization, graphene-based materials are characterized and investigated at the nanoscale by optical spectroscopy (Raman, Ellipsometry) and electrical measurements (Van der Pauw, Hall).
The research activity within the Apulian Graphene Lab, have already achieved important breakthroughs inside the EC project MEM4WIN on Smart Windows. Examples are: the production of high quality graphene layers on large area with a sheet resistance lower than 15 Ω/square and, reliable plasma-chemical methods designed for surface functionalization of graphene.