Radiofrequency plasma decomposition of CnF2 n+2-H2 and CF4-C2F4 mixtures during Si etching or fluoropolymer deposition

Authors: d’Agostino R., De Benedictis S., Cramarossa F.
Years: 1984
Source Title:
Doi: 10.1007/BF00567367
Venue: NanoChem @ URT Bari