PLASMA DIAGNOSTICS OF C//nF//2//n// plus //2-H//2 AND CF//4-C//2F//4 MIXTURES DURING Si-ETCHING OR POLYMER DEPOSITION.

Authors: Cramarossa F., d’Agostino R., De Benedictis S.
Years: 1983
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Doi:
Venue: NanoChem @ URT Bari