Mechanisms of deposition and etching of thin films of plasma-polymerized fluorinated monomers in radio frequency discharges fed with C2F 6-H2 and C2F6-O2 mixtures

Authors: D’Agostino R., Cramarossa F., Illuzzi F.
Years: 1987
Source Title:
Doi: 10.1063/1.337864
Venue: NanoChem @ URT Bari