Excimer Laser annealing for shallow junction formation in Si power MOS devices

Authors: Fortunato G., Privitera V., La Magna A., Mariucci L., Cuscuna M., Svensson B.G., Monakhov E., Camalleri M., Magri A., Salinas D., Simon F.
Years: 2006
Source Title: Thin Solid Films
Doi: 10.1016/j.tsf.2005.09.017
Venue: CNR Nanotec @ Lecce