Evaluation of plasmas fed with hydrofluorocarbons-oxygen mixtures for SiO2 dry etching
Evaluation of plasmas fed with hydrofluorocarbons-oxygen mixtures for SiO2 dry etching
Authors: Fracassi F., D’Agostino R., Illuzzi F.
Years: 2001
Source Title: Doi:10.1116/1.1354978 Venue: NanoChem @ URT Bari
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