Deposition rate, ion bombardment and gap states density in glow discharge a-Si:H,F films

Authors: Murri R., Schiavulli L., Bruno G., Capezzuto P., Grillo G.
Years: 1989
Source Title:
Doi: 10.1016/0040-6090(89)90248-4
Venue: NanoChem @ URT Bari