Deposition and etching of fluorocarbon thin films in atmospheric pressure DBDs fed with Ar-CF4-H2 and Ar-CF4-O2 mixtures

Authors: Fanelli F., Fracassi F., d’Agostino R.
Years: 2010
Source Title:
Doi: 10.1016/j.surfcoat.2009.11.011
Venue: NanoChem @ URT Bari