Chemical mechanisms in C3F8-H2 radiofrequency discharges
Chemical mechanisms in C3F8-H2 radiofrequency discharges
Authors: d’Agostino R., Cramarossa F., De Benedictis S.
Years: 1984
Source Title: Doi:10.1007/BF00567369 Venue: NanoChem @ URT Bari
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