Chemical and morphological characterization of low-k dielectric films deposited from hexamethyldisiloxane and ethylene RF Glow discharges

Authors: Coclite A.M., Milella A., Palumbo F., Fracassi F., D’Agostino R.
Years: 2010
Source Title:
Doi: 10.1002/ppap.201000091
Venue: NanoChem @ URT Bari