Boron distribution in silicon after multiple pulse excimer laser annealing

Authors: Monakhov E.V., Svensson B.G., Linnarsson M.K., La Magna A., Italia M., Privitera V., Fortunato G., Cuscun M., Mariucci L.
Years: 2005
Source Title: Applied Physics Letters
Doi: 10.1063/1.2032603
Venue: CNR Nanotec @ Lecce